{"success":true,"data":{"pressRelease":{"id":"137181","rtpr_id":"nBwqtX2La-20260908","ticker":"INTC","exchange":"NASDAQ","all_tickers":["INTC"],"title":"Intel Foundry and ASML Collaborate to Accelerate Industry Readiness for High NA EUV","author":"Business Wire","published_at":"2026-09-08T06:03:00.085Z","article_body":"Intel Foundry and ASML Collaborate to Accelerate Industry Readiness for High\nNA EUV\n\nThis week at the SPIE Photomask Technology + Extreme Ultraviolet Lithography\nconference, Intel Foundry and ASML highlighted continued progress in bringing\nHigh Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography into\nproduction and advancing the technologies that will shape its future adoption.\n\nSpecifically, Intel Foundry and ASML shared the following updates:\n\n\n * High NA continues to be used in high-volume manufacturing production at Intel\nFoundry today, with more than one million wafers processed to date across\nearly tool certification and testing, research and development efforts, and\nvolume production on select layers for a subset of Intel® Core™ Ultra\nSeries 3 processors, code-named Panther Lake. Overlay, throughput and\navailability are meeting Intel Foundry's expectations.\n\n * Products manufactured on Intel 18A using High NA for select layers continue to\ndeliver performance that meets or exceeds comparable layers patterned using\nthe NXE platform (EUV with numerical aperture of 0.33).\n\n * Customers can realize the benefits of High NA using the industry's current\nmask format, either by floor-planning within the 6-inch mask or by utilizing\nIntel Foundry’s stitching capabilities and process design kit (PDK)\nsolutions.\n\n * For more than three years, Intel Foundry has championed the large mask format\ninitiative to align the mask ecosystem, working closely with ASML, mask\nmakers, automation suppliers, EDA partners, materials providers, and\nsemiconductor manufacturers to advance the standards, infrastructure, and\ntechnology needed to support future High NA scaling.\n\n“Intel Foundry has been one of the key leaders of the industry's adoption of\nHigh NA, from installing the first commercial EXE system in 2024, to\nqualifying the latest generation of tools, to shipping the first high-volume\nlogic product manufactured with High NA,” said Christophe Fouquet, president\nand CEO, ASML. “ASML recognizes Intel Foundry's pioneering role in High NA\nand its innovations to deliver value today with 6-inch masks, as well as its\nlong-time support of the 6x12-inch mask evolution.”\n\n“The companies building the increasingly complex AI products of the future\nneed manufacturing innovations that are production-ready and easy to use,”\nsaid Naga Chandrasekaran, Intel Executive Vice President and Co-General\nManager of Intel Foundry. “Within our lithography capabilities, Intel\nFoundry is focused on near term enablement of High NA on 6-inch masks with or\nwithout stitching, and making the transition to 6x12-inch masks. We will\ncontinue to work closely with ASML and the entire industry to enable this\ntransition.”\n\nIntel Foundry and ASML are building on years of collaboration to bring\ntogether the lithography ecosystem around larger-format masks, helping drive\nstandards, infrastructure, and technology advances needed to support future\nHigh NA EUV scaling. Working alongside mask makers, automation suppliers, EDA\npartners, materials providers, and semiconductor manufacturers, the companies\nhave helped establish the industry's path to larger-format masks while\nenabling customers to realize the benefits of High NA EUV today.\n\nPresentations at SPIE Photomask Technology + Extreme Ultraviolet Lithography\n\nThis week at the SPIE Photomask Technology + Extreme Ultraviolet Lithography\nconference, Intel Foundry and ASML will share updates on reticle stitching, a\ntechnique that enables designers to use High NA EUV with today's standard\n6-inch masks. ASML's Jan van Schoot will present \"Scanner and mask\nrequirements to support half field stitching\" on Tuesday, September 8 at 11:00\na.m. Pacific time, followed by Intel Foundry's Kimberly Pierce, who will\npresent \"High NA EUV: stitching for manufacturing\" at 11:20 a.m. in the same\nsession.\n\nAbout Intel\n\nIntel (Nasdaq: INTC) designs and manufactures advanced semiconductors that\nconnect and power the modern world. Every day, our engineers create new\ntechnologies that enhance and shape the future of computing to enable new\npossibilities for every customer we serve. Learn more at intel.com\n(https://cts.businesswire.com/ct/CT?id=smartlink&url=https%3A%2F%2Fwww.intel.com%2F&esheet=54599073&newsitemid=20260907972389&lan=en-US&anchor=intel.com&index=1&md5=91beed9d448720835e2260dd9eabfc03)\n.\n\nAbout ASML\n\nASML is a leading supplier to the semiconductor industry. The company provides\nchipmakers with hardware, software and services to mass produce the patterns\nof integrated circuits (microchips). Together with its partners, ASML drives\nthe advancement of more affordable, more powerful, more energy-efficient\nmicrochips. ASML enables groundbreaking technology to solve some of humanity's\ntoughest challenges, such as in healthcare, energy use and conservation,\nmobility and agriculture. ASML is a multinational company headquartered in\nVeldhoven, the Netherlands, with offices across EMEA, the US and Asia. Every\nday, ASML’s more than 44,000 employees (FTE) challenge the status quo and\npush technology to new limits. ASML is traded on Euronext Amsterdam and NASDAQ\nunder the symbol ASML. Discover ASML – our products, technology and career\nopportunities – at www.asml.com\n(https://cts.businesswire.com/ct/CT?id=smartlink&url=http%3A%2F%2Fwww.asml.com&esheet=54599073&newsitemid=20260907972389&lan=en-US&anchor=www.asml.com&index=2&md5=564fe17eedb4ff78db5f99814608bcba)\n.\n\n\n\nView source version on businesswire.com:\nhttps://www.businesswire.com/news/home/20260907972389/en/\n(https://www.businesswire.com/news/home/20260907972389/en/)\n\nIntel Media Relations\n\nContactPR@Intel.com (mailto:ContactPR@Intel.com)\n\n\nCopyright Business Wire 2026","article_body_html":"","raw_payload":{"data":{"id":"nBwqtX2La-20260908","title":"Intel Foundry and ASML Collaborate to Accelerate Industry Readiness for High NA EUV","author":"Business Wire","ticker":"INTC","created":"2026-09-08T06:03:00.085Z","tickers":["INTC"],"exchange":"NASDAQ","article_body":"Intel Foundry and ASML Collaborate to Accelerate Industry Readiness for High\nNA EUV\n\nThis week at the SPIE Photomask Technology + Extreme Ultraviolet Lithography\nconference, Intel Foundry and ASML highlighted continued progress in bringing\nHigh Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography into\nproduction and advancing the technologies that will shape its future adoption.\n\nSpecifically, Intel Foundry and ASML shared the following updates:\n\n\n * High NA continues to be used in high-volume manufacturing production at Intel\nFoundry today, with more than one million wafers processed to date across\nearly tool certification and testing, research and development efforts, and\nvolume production on select layers for a subset of Intel® Core™ Ultra\nSeries 3 processors, code-named Panther Lake. Overlay, throughput and\navailability are meeting Intel Foundry's expectations.\n\n * Products manufactured on Intel 18A using High NA for select layers continue to\ndeliver performance that meets or exceeds comparable layers patterned using\nthe NXE platform (EUV with numerical aperture of 0.33).\n\n * Customers can realize the benefits of High NA using the industry's current\nmask format, either by floor-planning within the 6-inch mask or by utilizing\nIntel Foundry’s stitching capabilities and process design kit (PDK)\nsolutions.\n\n * For more than three years, Intel Foundry has championed the large mask format\ninitiative to align the mask ecosystem, working closely with ASML, mask\nmakers, automation suppliers, EDA partners, materials providers, and\nsemiconductor manufacturers to advance the standards, infrastructure, and\ntechnology needed to support future High NA scaling.\n\n“Intel Foundry has been one of the key leaders of the industry's adoption of\nHigh NA, from installing the first commercial EXE system in 2024, to\nqualifying the latest generation of tools, to shipping the first high-volume\nlogic product manufactured with High NA,” said Christophe Fouquet, president\nand CEO, ASML. “ASML recognizes Intel Foundry's pioneering role in High NA\nand its innovations to deliver value today with 6-inch masks, as well as its\nlong-time support of the 6x12-inch mask evolution.”\n\n“The companies building the increasingly complex AI products of the future\nneed manufacturing innovations that are production-ready and easy to use,”\nsaid Naga Chandrasekaran, Intel Executive Vice President and Co-General\nManager of Intel Foundry. “Within our lithography capabilities, Intel\nFoundry is focused on near term enablement of High NA on 6-inch masks with or\nwithout stitching, and making the transition to 6x12-inch masks. We will\ncontinue to work closely with ASML and the entire industry to enable this\ntransition.”\n\nIntel Foundry and ASML are building on years of collaboration to bring\ntogether the lithography ecosystem around larger-format masks, helping drive\nstandards, infrastructure, and technology advances needed to support future\nHigh NA EUV scaling. Working alongside mask makers, automation suppliers, EDA\npartners, materials providers, and semiconductor manufacturers, the companies\nhave helped establish the industry's path to larger-format masks while\nenabling customers to realize the benefits of High NA EUV today.\n\nPresentations at SPIE Photomask Technology + Extreme Ultraviolet Lithography\n\nThis week at the SPIE Photomask Technology + Extreme Ultraviolet Lithography\nconference, Intel Foundry and ASML will share updates on reticle stitching, a\ntechnique that enables designers to use High NA EUV with today's standard\n6-inch masks. ASML's Jan van Schoot will present \"Scanner and mask\nrequirements to support half field stitching\" on Tuesday, September 8 at 11:00\na.m. Pacific time, followed by Intel Foundry's Kimberly Pierce, who will\npresent \"High NA EUV: stitching for manufacturing\" at 11:20 a.m. in the same\nsession.\n\nAbout Intel\n\nIntel (Nasdaq: INTC) designs and manufactures advanced semiconductors that\nconnect and power the modern world. Every day, our engineers create new\ntechnologies that enhance and shape the future of computing to enable new\npossibilities for every customer we serve. Learn more at intel.com\n(https://cts.businesswire.com/ct/CT?id=smartlink&url=https%3A%2F%2Fwww.intel.com%2F&esheet=54599073&newsitemid=20260907972389&lan=en-US&anchor=intel.com&index=1&md5=91beed9d448720835e2260dd9eabfc03)\n.\n\nAbout ASML\n\nASML is a leading supplier to the semiconductor industry. The company provides\nchipmakers with hardware, software and services to mass produce the patterns\nof integrated circuits (microchips). Together with its partners, ASML drives\nthe advancement of more affordable, more powerful, more energy-efficient\nmicrochips. ASML enables groundbreaking technology to solve some of humanity's\ntoughest challenges, such as in healthcare, energy use and conservation,\nmobility and agriculture. ASML is a multinational company headquartered in\nVeldhoven, the Netherlands, with offices across EMEA, the US and Asia. Every\nday, ASML’s more than 44,000 employees (FTE) challenge the status quo and\npush technology to new limits. ASML is traded on Euronext Amsterdam and NASDAQ\nunder the symbol ASML. Discover ASML – our products, technology and career\nopportunities – at www.asml.com\n(https://cts.businesswire.com/ct/CT?id=smartlink&url=http%3A%2F%2Fwww.asml.com&esheet=54599073&newsitemid=20260907972389&lan=en-US&anchor=www.asml.com&index=2&md5=564fe17eedb4ff78db5f99814608bcba)\n.\n\n\n\nView source version on businesswire.com:\nhttps://www.businesswire.com/news/home/20260907972389/en/\n(https://www.businesswire.com/news/home/20260907972389/en/)\n\nIntel Media Relations\n\nContactPR@Intel.com (mailto:ContactPR@Intel.com)\n\n\nCopyright Business Wire 2026"},"type":"article","timestamp":"2026-09-08T06:03:00.128531034Z","server_sent_at_ms":1788847380128},"received_at":"2026-09-08T06:03:00.187Z","source_url":"https://www.businesswire.com/news/home/20260907972389/en/"},"analysis":{"id":"126059","press_release_id":"137181","analysis_json":{"industry":{"label":"Semiconductors & Semiconductor Equipment","sector":"Information Technology"},"redFlags":["Promotional technical release with no financial metrics, bookings, or quantified customer commitments; foundry revenue impact is not disclosed"],"eventType":"operations_update","narrative":"Intel Foundry and ASML used the SPIE photomask conference to showcase progress bringing High NA EUV lithography into production, with more than one million wafers processed to date across tool certification, R&D, and volume manufacturing.\n\nHigh NA is already running on select layers of Panther Lake (Intel Core Ultra Series 3), and Intel says 18A layers patterned with High NA meet or exceed comparable layers patterned on ASML's NXE platform.\n\nCustomers can adopt High NA using today's standard 6-inch mask format via floorplanning or Intel's stitching capability and PDK, while the two companies continue aligning the ecosystem toward 6x12-inch large-format masks -- a transition ASML CEO Christophe Fouquet publicly credited Intel Foundry with pioneering.","sentiment":"bullish","agentHooks":{"shouldPost":false,"suggestedAngle":"ASML's CEO publicly endorses Intel Foundry as the High NA EUV leader -- a credibility marker for the foundry turnaround, though no financials are attached."},"keyFigures":{"customDimensions":{"wafers_processed":"1,000,000+","wafers_processed_context":"cumulative High NA wafers across early tool certification, R&D, and volume production on select layers","high_na_production_status":"high-volume manufacturing production on select layers of Intel Core Ultra Series 3 (Panther Lake)","large_mask_initiative_years":"3+ years","first_commercial_exe_system_installed":"2024"}},"quotedText":"from installing the first commercial EXE system in 2024","namedEntities":{"people":[{"name":"Christophe Fouquet","role":"President and CEO, ASML"},{"name":"Naga Chandrasekaran","role":"Intel Executive Vice President and Co-General Manager of Intel Foundry"},{"name":"Jan van Schoot","role":"ASML presenter at SPIE conference"},{"name":"Kimberly Pierce","role":"Intel Foundry presenter at SPIE conference"}],"products":["High NA EUV lithography (EXE system)","Intel Core Ultra Series 3 processors (Panther Lake)","Intel 18A","NXE platform","6-inch and 6x12-inch mask formats"],"companies":[{"name":"Intel","ticker":"INTC","relationship":"filer"},{"name":"Intel Foundry","relationship":"subsidiary/business unit of the filer"},{"name":"ASML","ticker":"ASML","relationship":"lithography equipment partner and supplier"}],"dollarAmounts":[]},"materialImpact":{"score":2,"reasoning":"A technical ecosystem milestone: >1 million High NA wafers processed and volume production on select Panther Lake layers, plus a public ASML endorsement of Intel Foundry's lithography leadership. Strategically supportive of the foundry narrative, but the release contains no financial figures, bookings, or new commercial commitments -- conference-stage update, not market-moving."},"tickerRelevance":{"others":[{"ticker":"ASML","relevance":"partner"}],"primary":"INTC"},"globalImportance":25,"audienceRelevance":45,"eventTypeSecondary":["partnership"],"importanceComponents":{"tickerTier":"mega-cap","eventGravity":"technical-milestone-pr","sectorWeight":"semiconductors-high-visibility","partnerEndorsement":"ASML CEO publicly credits Intel Foundry with High NA leadership","householdBrandBoost":true,"financialQuantification":"none -- no revenue, bookings, or deal terms disclosed"}},"event_type":"operations_update","event_type_secondary":["partnership"],"sentiment":"bullish","material_impact_score":2,"narrative":"Intel Foundry and ASML used the SPIE photomask conference to showcase progress bringing High NA EUV lithography into production, with more than one million wafers processed to date across tool certification, R&D, and volume manufacturing.\n\nHigh NA is already running on select layers of Panther Lake (Intel Core Ultra Series 3), and Intel says 18A layers patterned with High NA meet or exceed comparable layers patterned on ASML's NXE platform.\n\nCustomers can adopt High NA using today's standard 6-inch mask format via floorplanning or Intel's stitching capability and PDK, while the two companies continue aligning the ecosystem toward 6x12-inch large-format masks -- a transition ASML CEO Christophe Fouquet publicly credited Intel Foundry with pioneering.","key_figures":{"customDimensions":{"wafers_processed":"1,000,000+","wafers_processed_context":"cumulative High NA wafers across early tool certification, R&D, and volume production on select layers","high_na_production_status":"high-volume manufacturing production on select layers of Intel Core Ultra Series 3 (Panther Lake)","large_mask_initiative_years":"3+ years","first_commercial_exe_system_installed":"2024"}},"named_entities":{"people":[{"name":"Christophe Fouquet","role":"President and CEO, ASML"},{"name":"Naga Chandrasekaran","role":"Intel Executive Vice President and Co-General Manager of Intel Foundry"},{"name":"Jan van Schoot","role":"ASML presenter at SPIE conference"},{"name":"Kimberly Pierce","role":"Intel Foundry presenter at SPIE conference"}],"products":["High NA EUV lithography (EXE system)","Intel Core Ultra Series 3 processors (Panther Lake)","Intel 18A","NXE platform","6-inch and 6x12-inch mask formats"],"companies":[{"name":"Intel","ticker":"INTC","relationship":"filer"},{"name":"Intel Foundry","relationship":"subsidiary/business unit of the filer"},{"name":"ASML","ticker":"ASML","relationship":"lithography equipment partner and supplier"}],"dollarAmounts":[]},"model_name":"glm-4.7","prompt_hash":"sha256:727b4b9429a443af","schema_hash":"sha256:05005c02d9cffac9","created_at":"2026-09-08T06:12:36.390Z","global_importance":25,"audience_relevance":45,"importance_components":{"tickerTier":"mega-cap","eventGravity":"technical-milestone-pr","sectorWeight":"semiconductors-high-visibility","partnerEndorsement":"ASML CEO publicly credits Intel Foundry with High NA leadership","householdBrandBoost":true,"financialQuantification":"none -- no revenue, bookings, or deal terms disclosed"}},"durationMs":88405,"modelName":"glm-4.7"}}