{"success":true,"data":{"pressRelease":{"id":"160051","rtpr_id":"nBw5Xjf2Ra-20261005","ticker":"6951","exchange":"TSE Tokyo","all_tickers":["6951"],"title":"JEOL: Sales launch of HAXIS: The New Low-angle Ion Milling Scanning Electron Microscope","author":"Business Wire","published_at":"2026-10-05T07:30:00.098Z","article_body":"JEOL: Sales launch of HAXIS: The New Low-angle Ion Milling Scanning Electron\nMicroscope\n\nJEOL Ltd. (President & CEO Izumi Oi) announces the development of its new\nlow‑angle ion‑milling scanning electron microscope, HAXIS, and will\ncommence sales on October 5, 2026.\n\nThis press release features multimedia. View the full release here:\nhttps://www.businesswire.com/news/home/20260928207899/en/\n(https://www.businesswire.com/news/home/20260928207899/en/)\n\nHAXIS Low-angle Ion Milling Scanning Electron Microscope\n\nHAXIS Low-angle Ion Milling Scanning Electron Microscope\n\nBackground of development\n\nAs advanced semiconductor device structures continue to shrink and grow more\ncomplex, it has become difficult to contact and measure microscale circuits\nusing nano-manipulators. In addition, contact caused by probing may affect the\nanalysis target, necessitating new failure analysis methods.\n\nJEOL has conducted long-term research on the passive voltage contrast (PVC)\ndetection technology and established a method for stable, highly reproducible\nPVC observation technology through the advancement of detectors and sample\npreparation techniques.\n\nHAXIS is JEOL's new semiconductor failure analysis platform that combines such\ntechnologies.\n\nIt has realized clear and highly reproducible PVC observation even with\nadvanced semiconductors. By visually detecting electrical anomalies while\nminimizing the effects of processing damage and contamination, it is possible\nto efficiently identify the defect location and determine the cause. The use\nof argon (Ar), an inert gas, ensures stable surface quality and reduces\nrunning costs.\n\nThe quality of PVC observation is significantly affected by the surface\ncondition of the sample after delayering. HAXIS uses a unique Low-Angle Ion\nMilling (LIM) delayering technique using Ar ion beams to create a flat surface\nwith minimal damage to the sample surface. This enables clear and highly\nreproducible PVC observation while retaining structure and potential\ninformation even in advanced devices.\n\nSemiconductor failure analysis involves multiple steps, from defect\nlocalization to physical analysis and root-cause investigation. As device\ncomplexity increases, shortening the turnaround time from failure detection to\nactionable results becomes increasingly critical.\n\nHAXIS introduces a new approach to failure localization by integrating LIM\ndelayering with SEM imaging and passive voltage contrast (PVC) analysis. This\ncombined workflow enables rapid and highly accurate identification of failure\nlocations, supporting QTAT (Quick Turnaround Time) failure analysis and\naccelerating the transition from electrical failure detection to physical\nanalysis and root-cause identification.\n\nMain features\n\n\n 1. Clear PVC imaging\n\n 2. Cost effective Ar processing\n\n 3. Damageless Delayering with LIM\n\n 4. Layer-by-layer LIM / PVC Analysis\n\n 5. Contamination free transfer\n\nSales target\n\n15 units / year\n\nProduct Overview\n\nHAXIS LIM-SEM Multi Beam System\n\nhttps://www.jeol.com/products/scientific/sem/haxis.php\n(https://cts.businesswire.com/ct/CT?id=smartlink&url=https%3A%2F%2Fwww.jeol.com%2Fproducts%2Fscientific%2Fsem%2Fhaxis.php&esheet=54612669&newsitemid=20260928207899&lan=en-US&anchor=https%3A%2F%2Fwww.jeol.com%2Fproducts%2Fscientific%2Fsem%2Fhaxis.php&index=1&md5=a963987badd4279fa730124f0699b83f)\n\n\n\nView source version on businesswire.com:\nhttps://www.businesswire.com/news/home/20260928207899/en/\n(https://www.businesswire.com/news/home/20260928207899/en/)\n\nJEOL Ltd.\n\n3-1-2, Musashino, Akishima, Tokyo, 196-8558, Japan\n\nIzumi Oi, President & CEO\n\n(Stock code: 6951, Tokyo Stock Exchange Prime Market)\n\nhttps://www.jeol.com/\n(https://cts.businesswire.com/ct/CT?id=smartlink&url=https%3A%2F%2Fwww.jeol.com%2F&esheet=54612669&newsitemid=20260928207899&lan=en-US&anchor=https%3A%2F%2Fwww.jeol.com%2F&index=2&md5=a4eb962d32007ca4826ef2f7c97c1879)\n\nJEOL Ltd.\n\nSI Sales Division\n\nwebmaster@jeol.co.jp \n(mailto:webmaster@jeol.co.jp) \nhttps://www.jeol.com/contacts/products.php\n(https://cts.businesswire.com/ct/CT?id=smartlink&url=https%3A%2F%2Fwww.jeol.com%2Fcontacts%2Fproducts.php&esheet=54612669&newsitemid=20260928207899&lan=en-US&anchor=https%3A%2F%2Fwww.jeol.com%2Fcontacts%2Fproducts.php&index=3&md5=5da42e7cbdec5ac48862cb5ea7da4220)\n\n\nCopyright Business Wire 2026","article_body_html":"","raw_payload":{"data":{"id":"nBw5Xjf2Ra-20261005","title":"JEOL: Sales launch of HAXIS: The New Low-angle Ion Milling Scanning Electron Microscope","author":"Business Wire","ticker":"6951","created":"2026-10-05T07:30:00.098Z","tickers":["6951"],"exchange":"TSE Tokyo","article_body":"JEOL: Sales launch of HAXIS: The New Low-angle Ion Milling Scanning Electron\nMicroscope\n\nJEOL Ltd. (President & CEO Izumi Oi) announces the development of its new\nlow‑angle ion‑milling scanning electron microscope, HAXIS, and will\ncommence sales on October 5, 2026.\n\nThis press release features multimedia. View the full release here:\nhttps://www.businesswire.com/news/home/20260928207899/en/\n(https://www.businesswire.com/news/home/20260928207899/en/)\n\nHAXIS Low-angle Ion Milling Scanning Electron Microscope\n\nHAXIS Low-angle Ion Milling Scanning Electron Microscope\n\nBackground of development\n\nAs advanced semiconductor device structures continue to shrink and grow more\ncomplex, it has become difficult to contact and measure microscale circuits\nusing nano-manipulators. In addition, contact caused by probing may affect the\nanalysis target, necessitating new failure analysis methods.\n\nJEOL has conducted long-term research on the passive voltage contrast (PVC)\ndetection technology and established a method for stable, highly reproducible\nPVC observation technology through the advancement of detectors and sample\npreparation techniques.\n\nHAXIS is JEOL's new semiconductor failure analysis platform that combines such\ntechnologies.\n\nIt has realized clear and highly reproducible PVC observation even with\nadvanced semiconductors. By visually detecting electrical anomalies while\nminimizing the effects of processing damage and contamination, it is possible\nto efficiently identify the defect location and determine the cause. The use\nof argon (Ar), an inert gas, ensures stable surface quality and reduces\nrunning costs.\n\nThe quality of PVC observation is significantly affected by the surface\ncondition of the sample after delayering. HAXIS uses a unique Low-Angle Ion\nMilling (LIM) delayering technique using Ar ion beams to create a flat surface\nwith minimal damage to the sample surface. This enables clear and highly\nreproducible PVC observation while retaining structure and potential\ninformation even in advanced devices.\n\nSemiconductor failure analysis involves multiple steps, from defect\nlocalization to physical analysis and root-cause investigation. As device\ncomplexity increases, shortening the turnaround time from failure detection to\nactionable results becomes increasingly critical.\n\nHAXIS introduces a new approach to failure localization by integrating LIM\ndelayering with SEM imaging and passive voltage contrast (PVC) analysis. This\ncombined workflow enables rapid and highly accurate identification of failure\nlocations, supporting QTAT (Quick Turnaround Time) failure analysis and\naccelerating the transition from electrical failure detection to physical\nanalysis and root-cause identification.\n\nMain features\n\n\n 1. Clear PVC imaging\n\n 2. Cost effective Ar processing\n\n 3. Damageless Delayering with LIM\n\n 4. Layer-by-layer LIM / PVC Analysis\n\n 5. Contamination free transfer\n\nSales target\n\n15 units / year\n\nProduct Overview\n\nHAXIS LIM-SEM Multi Beam System\n\nhttps://www.jeol.com/products/scientific/sem/haxis.php\n(https://cts.businesswire.com/ct/CT?id=smartlink&url=https%3A%2F%2Fwww.jeol.com%2Fproducts%2Fscientific%2Fsem%2Fhaxis.php&esheet=54612669&newsitemid=20260928207899&lan=en-US&anchor=https%3A%2F%2Fwww.jeol.com%2Fproducts%2Fscientific%2Fsem%2Fhaxis.php&index=1&md5=a963987badd4279fa730124f0699b83f)\n\n\n\nView source version on businesswire.com:\nhttps://www.businesswire.com/news/home/20260928207899/en/\n(https://www.businesswire.com/news/home/20260928207899/en/)\n\nJEOL Ltd.\n\n3-1-2, Musashino, Akishima, Tokyo, 196-8558, Japan\n\nIzumi Oi, President & CEO\n\n(Stock code: 6951, Tokyo Stock Exchange Prime Market)\n\nhttps://www.jeol.com/\n(https://cts.businesswire.com/ct/CT?id=smartlink&url=https%3A%2F%2Fwww.jeol.com%2F&esheet=54612669&newsitemid=20260928207899&lan=en-US&anchor=https%3A%2F%2Fwww.jeol.com%2F&index=2&md5=a4eb962d32007ca4826ef2f7c97c1879)\n\nJEOL Ltd.\n\nSI Sales Division\n\nwebmaster@jeol.co.jp \n(mailto:webmaster@jeol.co.jp) \nhttps://www.jeol.com/contacts/products.php\n(https://cts.businesswire.com/ct/CT?id=smartlink&url=https%3A%2F%2Fwww.jeol.com%2Fcontacts%2Fproducts.php&esheet=54612669&newsitemid=20260928207899&lan=en-US&anchor=https%3A%2F%2Fwww.jeol.com%2Fcontacts%2Fproducts.php&index=3&md5=5da42e7cbdec5ac48862cb5ea7da4220)\n\n\nCopyright Business Wire 2026"},"type":"article","timestamp":"2026-10-05T07:30:00.132257429Z","server_sent_at_ms":1791185400132},"received_at":"2026-10-05T07:30:00.183Z","source_url":"https://www.businesswire.com/news/home/20260928207899/en/"},"analysis":{"id":"148628","press_release_id":"160051","analysis_json":{"industry":{"label":"Electronic Equipment, Instruments & Components","sector":"Information Technology"},"redFlags":[],"eventType":"product_launch","narrative":"JEOL launched sales of HAXIS, a new low-angle ion-milling scanning electron microscope for semiconductor failure analysis, starting October 5, 2026.\n\nThe platform combines argon-ion Low-Angle Ion Milling delayering with SEM imaging and passive voltage contrast detection to localize electrical defects faster on advanced chips.\n\nThe company targets sales of 15 units per year, a niche but strategically relevant addition to its semiconductor tooling lineup as device structures shrink.","sentiment":"bullish","agentHooks":{"shouldPost":false,"suggestedAngle":"New failure-analysis tool targets shrinking semiconductor nodes; 15-unit/year target suggests modest near-term revenue contribution."},"keyFigures":{"customDimensions":{"sales_target":"15 units / year"}},"namedEntities":{"people":[{"name":"Izumi Oi","role":"President & CEO"}],"products":["HAXIS","HAXIS LIM-SEM Multi Beam System"],"companies":[{"name":"JEOL Ltd.","ticker":"6951","relationship":"filer"}],"dollarAmounts":[]},"materialImpact":{"score":2,"reasoning":"Routine product launch of a niche scientific instrument (HAXIS failure-analysis SEM) with a modest 15-unit annual sales target. 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